http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010223964-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_421cadb30fc0074fe61126eb980d19d6 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B11-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-956 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 |
| filingDate | 2010-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_08440c0dc5fccb85ff3161ff49be50c1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_571681b1d6dac5d9e2c85d405e5eb30d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a441e83c52b0040a6792aba1b948308d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1320107288dbfe6993e80f96972ada6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b65198ea3b6b2acdacd5aea8817bf7e4 |
| publicationDate | 2010-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2010223964-A |
| titleOfInvention | Defect inspection apparatus and method |
| abstract | In semiconductor manufacturing or magnetic head manufacturing, scratches having various shapes generated on the surface of an object to be processed (for example, an insulating film on a semiconductor substrate) when polishing or grinding such as CMP is performed. It is an object of the present invention to provide a defect inspection apparatus and method capable of discriminating and inspecting particles and foreign particles adhering thereto. A defect inspection apparatus irradiates a surface of an inspection object with a first illumination system that irradiates the surface of the inspection object with a first UV light and a second UV light obliquely with respect to the surface of the inspection object. A second illumination system; detection optical system means for collecting and detecting scattered light from the object to be inspected by a condenser lens; and an arithmetic processing unit for processing the detection signal to discriminate defects. The reflection mirror of the first illumination system is disposed between the condenser lens and the stage on the optical axis of the condenser lens to reflect the first UV light incident from the direction parallel to the surface of the inspection object. It was configured to irradiate the surface of the object to be inspected from the vertical direction by reflecting with a mirror. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7102271-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110729210-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020013841-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110729210-A |
| priorityDate | 2010-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.