http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010217409-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-14 |
| filingDate | 2009-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e0ab18bc267841f438496f063934a0a |
| publicationDate | 2010-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2010217409-A |
| titleOfInvention | Manufacturing method of color filter |
| abstract | Provided is a method for manufacturing a color filter capable of processing and forming a fine and good pattern with good rectangularity while suppressing roughness and unnecessary cutting of a film surface and a substrate surface. A method of manufacturing a color filter provided on a support having at least a plurality of light receiving elements, comprising: (a) an organic layer forming step of forming an organic layer on the support; and (b) a patterned photo. An etching process for dry-etching the organic layer using a mixed gas containing one or more gases selected from nitrogen, ammonia, and hydrogen and oxygen gas using the resist layer as a mask; and (c) the etching process And a photoresist removal step of selectively dissolving and removing the remaining photoresist layer with an organic solvent. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2015174189-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015174189-A1 |
| priorityDate | 2009-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 85.