| abstract |
A positive resist composition capable of forming a resist film having high hydrophobicity on the film surface and a resist pattern forming method using the positive resist composition. A (meth) acrylate structural unit (a0) containing a cyclic group containing —SO 2 — in its ring skeleton and a structural unit derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group ( a positive resist composition comprising a polymer compound (A1) having a1), an acid generator component (B), and a fluorine-containing polymer compound (F1) having a structural unit containing a base-dissociable group . [Selection figure] None |