| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-1089
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28556
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-09701 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53238
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76873
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-288
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205 |
| filingDate |
2007-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb3635512c67f1186a47e4b0ac51365e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd3f80b5537e8ab56c35c6e87c990faf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bce9bb713f9fad9c1254190ba8c3f44e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e7a71d9cb660a30f2d1ddef932231999
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29d86490305cf48157d6d4c81a0de428
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4f927a10489d5225d1598cd889932c0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1fb372bd1c1015cc794d6c9a8f76a553 |
| publicationDate |
2010-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2010192467-A |
| titleOfInvention |
Method and system for forming film to be processed |
| abstract |
There is provided a film forming method capable of sufficiently filling a recess having a small line width or hole diameter or a recess having a high aspect ratio. In a film forming method for forming a thin film on an object to be processed W on which an insulating layer 4 having a recess 6 is formed, Ti is applied to the surface of the object to be processed including the surface in the recess. A barrier layer forming step for forming the barrier layer 12 including the seed layer, a seed layer forming step for forming the seed layer 16 including Ru on the barrier layer, and Cu for assisting conductivity to the seed layer on the seed layer. An auxiliary seed layer forming step of forming an auxiliary seed layer 164 including [Selection] Figure 4 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8878364-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014041946-A |
| priorityDate |
2007-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |