| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5e5c121269689cbab9b3a4548b15caf3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c5520dd38cc403678d9f91e0b0ee95fb |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23H9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23H1-00 |
| filingDate |
2009-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6cc27d8432b8b4f3516947d079214aee
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_556cdc77347298b6e40dc565e6ef4d84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c52e8ded6f59902c603a3e5ad5aa4767 |
| publicationDate |
2010-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2010188473-A |
| titleOfInvention |
Substrate surface processing method and substrate surface processing apparatus |
| abstract |
An object of the present invention is to facilitate the removal processability of a substrate surface on which a highly reactive substance generated by underwater plasma has acted, further improve the stability of the plasma, and generate undesired through holes on the surface of the workpiece. Provided are a substrate surface processing method and a substrate surface processing apparatus capable of avoiding the formation of a large number of irregularities. Plasma is generated in water, and fine particles 4 are supplied to remove the surface of a substrate 1 to be processed. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I668075-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014127705-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10471565-B2 |
| priorityDate |
2009-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |