http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010186949-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0c468e687b43595cae7cb1c2667678f1 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
| filingDate | 2009-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b716df296bdabd572b3216c567167592 |
| publicationDate | 2010-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2010186949-A |
| titleOfInvention | Semiconductor manufacturing apparatus and semiconductor manufacturing method |
| abstract | A semiconductor manufacturing apparatus and a semiconductor manufacturing method capable of improving the film thickness uniformity with high productivity are provided. A reaction chamber 11 in which a wafer w is introduced and a film forming process is performed, and a holder 13 for holding the wafer w is disposed at the top, and heaters 15 and 16 for heating the wafer w are disposed therein. A rotation drive mechanism 17 that is connected to the rotating body 12 and rotates the wafer w, a gas supply mechanism that supplies a predetermined flow rate of process gas to the reaction chamber 11 from above the reaction chamber 11, and a gas that is discharged from below the reaction chamber. A gas discharge mechanism that controls the reaction chamber to a predetermined pressure, a first rectifying plate 20 that rectifies the supplied process gas and supplies it to the wafer w held by the holder 13, and an inner wall of the reaction chamber 11. A second rectifying plate 21 provided between the rotators 12 and having openings 21a arranged so as to have different opening densities in the horizontal direction. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106894001-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106894001-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101408790-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10103018-B2 |
| priorityDate | 2009-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.