| abstract |
The present invention provides a high-energy photon source that is reliable, has a high repetition rate, and is compatible with a production line. A very hot plasma containing an active material is generated in a vacuum chamber. The active material is an atom having an emission line in the desired extreme ultraviolet (EUV) range. A pulsed power supply with a charging capacitor and a magnetic compression circuit with a pulse converter provides an electrical pulse with enough energy and potential to generate EUV light at an intermediate focus at a rate of over 5 watts. In a preferred embodiment designed by the applicant, the in-band EUV light energy at the intermediate focus is 45 watts and can be further expanded to 105.8 watts. [Selection] Figure 2A (21) |