http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010174375-A

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filingDate 2010-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_34a584faa8497855d31b3e7d3ac54f12
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publicationDate 2010-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2010174375-A
titleOfInvention Hard coating and sputtering target material for forming hard coating
abstract PROBLEM TO BE SOLVED: To provide a hard coating superior in wear resistance to TiN coating and TiAlN coating, which are conventional hard coatings, and a sputtering target material for forming the hard coating. A [1] (Zr 1-ab , Hf a, M b) (C 1-x N x) consisting of hard coating (where, M is W, 1 or more Mo) a, 0 ≦ 1−a−b, 0 ≦ a, 0.03 ≦ b ≦ 0.35, and 0 ≦ x ≦ 1, a hard film characterized by satisfying [2] (Zr 1-abc , Hf a , M b , D c ) (C 1-x N x ) hard film (where D is one or more of Si and B), and 0 ≦ 1-ab, 0 ≦ a, 0.03 ≦ b ≦ Hard film etc. characterized by satisfying 0.35, 0.03 ≦ c ≦ 0.3, 0 ≦ x ≦ 1. In the above formula, a represents the atomic ratio of Hf, b represents the atomic ratio of M, c represents the atomic ratio of D, and x represents the atomic ratio of N. [Selection figure] None
priorityDate 2010-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 24.