http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010168457-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_696ca0ae93d5cf5a686273601361781f |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28 |
filingDate | 2009-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59524cef9eb83830e0edd888a8856e08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f15abea88572576cc528bffedcfcddc |
publicationDate | 2010-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2010168457-A |
titleOfInvention | ADAMANTAN DERIVATIVE AND RESIN COMPOSITION USING THE SAME |
abstract | The present invention relates to a chemically amplified resist sensitive to far-ultraviolet rays typified by an ArF excimer laser and the like, and alkali developability and substrate adhesion capable of achieving an improvement in resolution and line edge roughness without impairing the basic physical properties of the resist. Of a functional resin composition having excellent resistance and an adamantane derivative as a raw material thereof An adamantane derivative having a hydroxymethyl group and a (meth) acryloyl group represented by the following formula as a substituent on an adamantane ring. And a functional resin composition comprising the derivative as a repeating unit. [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013008509-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2013008509-A1 |
priorityDate | 2009-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 301.