http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010160417-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate | 2009-01-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_694db723d5380c13294d67a1e2a7d434 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f98f95c481c61f2ee76a4d959889b0bd |
| publicationDate | 2010-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2010160417-A |
| titleOfInvention | Photosensitive resin composition, photosensitive element using the same, resist pattern forming method, and printed wiring board manufacturing method |
| abstract | PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having excellent tent strength and sufficient photosensitivity, resolution, adhesion, and peeling properties, a photosensitive element using the same, a method for forming a resist pattern, and a printed wiring board Provide manufacturing method. A photosensitive resin composition comprising (A) a binder polymer, (B) a photopolymerizable compound having at least one ethylenically unsaturated bond in the molecule, and (C) a photopolymerization initiator. The component (B) comprises (B1) a compound represented by the following general formula (I), (B2) two ethylenically unsaturated groups in the molecule, and an oxyethylene group and / or an oxypropylene group. And a photosensitive resin composition containing the compound. [Chemical 1] (In general formula (I), R 1 represents a hydrogen atom or a methyl group.) [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012203407-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012134335-A |
| priorityDate | 2009-01-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 126.