| abstract |
【Task】 Catalyst-free metallization method on dielectric substrate surface and dielectric substrate with metal film that realizes pollution-free high efficiency that does not require any external metal species by fusion of atmospheric pressure plasma process and nano-level self-organization I will provide a. [Solution] A process of introducing a hydrophilic functional group on the surface of the dielectric substrate by atmospheric pressure plasma treatment using a rare gas, a complex polymer and a precursor containing the same metal species as the plating layer by a liquid phase method The process of coating and making ultra-thin films, the complexing polymer spontaneously forms a covalent bond with the hydrophilic functional group as the reaction point and grafts with high density, and the precursor is linked to the complexing polymer by coordination bond , A process of reducing the metal ions to atomic metal by treating the complexed polymer film containing this metal ion with atmospheric pressure plasma, and the generated atomic metal aggregates in a self-organized manner to form nano-sized clusters Then, the method comprises a step of immersing in an electroless plating bath to form a metal layer. [Selection] Figure 1 |