http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010152013-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-84 |
| filingDate | 2008-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ba0962857d989e8d58762707b91f178 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c12385bffcd4e345553edf0e4d2ec3cc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e44e54410276a4e91fdc5e3e4ecc1e11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf5e4b1f702962813f3f61a59a7185c2 |
| publicationDate | 2010-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2010152013-A |
| titleOfInvention | Pattern forming method, imprint mold, and magnetic recording medium manufacturing method |
| abstract | A pattern forming method capable of optimally designing a track width or the like according to the shape of a recording head or the like. A step of forming a composition film containing a diblock copolymer on a substrate, and phase-separating the composition film containing the diblock copolymer into a cylinder or a lamellar shape in a first direction, Forming an easy-etching region containing a first phase component extending in a first direction, forming a resist film on the composition film containing the phase-separated diblock copolymer, and an electron beam A step of forming a pattern extending in a second direction intersecting the first direction on the resist film by drawing or light exposure; and a step of forming a pattern of the resist film patterned by electron beam or light exposure and the second phase. And a step of etching the substrate using an etching resistant pattern containing a component as a mask. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8703407-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012228877-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012059802-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014510394-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5318217-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9152053-B2 |
| priorityDate | 2008-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 30.