| abstract |
At least a portion of a carbon-containing species in an organic silicate (OSG) film is removed. Described herein is a process of treating an OSG film with a chemical such as, but not limited to, an oxidizer, a process of exposing to an energy source including an OSG film ultraviolet light, Alternatively, it is a method for removing at least a part of the carbon-containing species in the organic silicate (OSG) film by treating the OSG film with a chemical and exposing the OSG film to an energy source. [Selection figure] None |