http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010134285-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2008-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1037a749a7d25144305b690cd1dbda52 |
| publicationDate | 2010-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2010134285-A |
| titleOfInvention | Chemically amplified positive resist composition and pattern forming method |
| abstract | Provided are a positive resist composition having high sensitivity, having no substrate dependency, and having an excellent profile shape even when a basic substrate is used, and a pattern forming method using the same. A chemically amplified positive resist composition comprising a group capable of decomposing under the action of an acid to produce an alkali-soluble group, and a compound (N) having at least one diazo group. Provided is a pattern forming method using [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9235118-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012168279-A |
| priorityDate | 2008-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 281.