http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010134228-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1335
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20
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filingDate 2008-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e0ab18bc267841f438496f063934a0a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_51cd3254599de9c49b1d16acff1e97c6
publicationDate 2010-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2010134228-A
titleOfInvention Color filter manufacturing method and solid-state imaging device
abstract It is possible to form a black matrix with high accuracy by eliminating a residue generated from a metal pigment. An etching stopper layer is formed on a support, and a black light shielding layer is formed on the etching stopper layer. After the photoresist layer 47 is formed on the black light shielding layer 46, a pattern is formed on the photoresist layer 47. When etching the black light shielding layer 46 using the photoresist layer 47 as a mask, first, an opening forming dry etching process is performed with a mixed gas containing at least two kinds of fluorocarbon gases and oxygen gas, and then the opening is formed. The etching stopper layer 45 is removed by subjecting the residue generated by the dry etching process to a residue-removing dry etching process using a mixed gas containing oxygen gas and further performing a lower layer removing dry etching process using a mixed gas containing a fluorocarbon-based gas and oxygen gas. be able to. [Selection] Figure 8
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015207638-A
priorityDate 2008-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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