http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010120807-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B9-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01D3-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01D3-02
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filingDate 2008-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8cfb7c4bf9f283054043056afc0fdc45
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af14c50d77dd4a2fc885561a017a448d
publicationDate 2010-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2010120807-A
titleOfInvention Selective immobilization of chlorine and fluorine in flon destruction gas or dry etching exhaust gas and recycling of recovered materials
abstract An object of the present invention is to selectively fix hydrogen chloride and hydrogen fluoride in a flon-breaking gas or dry etching exhaust gas by a dry method using a sodium compound, and a chlorine content as a solid matter of sodium chloride. Provides a method for recovery and reuse as sodium fluoride and / or sodium acid fluoride. SOLUTION: A gas produced by destroying chlorofluorocarbon-containing fluorocarbons, or hydrogen chloride and hydrogen fluoride in dry etching exhaust gas, and a multi-stage solid layer mainly composed of sodium hydrogen carbonate is used. By the dry method, the front layer is recovered as sodium chloride selectively immobilized with chlorine, and the rear layer is recovered as sodium fluoride and / or acid sodium fluoride with immobilized fluorine. . These recovered materials are reused as industrial raw materials. [Selection] Figure 5
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priorityDate 2008-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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