| abstract |
A positive resist composition having an excellent resist pattern shape and a resist pattern forming method using the positive resist composition are provided. A polymer compound (A1) having a structural unit (a0) represented by a general formula (a0-1) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group. A positive resist composition containing a base material component (A) to be contained and an acid generator component (B) containing an acid generator (B1) having an anion moiety represented by general formula (I). [Selection figure] None |