http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010107905-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-095 |
filingDate | 2008-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c177185dc66226e612d0d2da29dbce8 |
publicationDate | 2010-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2010107905-A |
titleOfInvention | Acid transfer resin film forming composition, acid transfer resin film and pattern forming method |
abstract | An acid transfer resin film capable of preventing intermixing and a pattern forming method capable of forming a pattern by an existing photolithography process using the acid transfer resin film are provided. (A) a radiation sensitive acid generator, and (B) a polymer having a cyano group at the terminal. The present acid transfer resin film is characterized by using the present acid transfer resin film forming composition. In this pattern forming method, (I) a second resin comprising a composition for forming an acid transfer resin film on a first resin film containing a resin having an acid-dissociable group and not containing a radiation-sensitive acid generator. A step of forming a resin film; (II) a step of exposing the second resin film through a mask to generate an acid in the second resin film; and (III) an acid generated in the second resin film. A copying step for transferring to the film and (IV) a step for removing the second resin film are provided in this order. [Selection] Figure 1 |
priorityDate | 2008-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 344.