| abstract |
SOLUTION: (A) a polymer compound having a repeating unit of formula (1), (B) a polymer compound that becomes soluble in an alkali developer by the action of an acid, and (C) an acid by exposure to high energy rays. A resist material containing a generated compound and (D) an organic solvent. According to the present invention, a resist material using a novel polymer additive having a cyclic acetal structure is provided. This polymer material can be adjusted for various properties such as water repellency, water slidability, fat solubility, acid decomposability and hydrolyzability. [Selection figure] None |