abstract |
Provided are a novel compound useful as an acid generator for a resist composition, a compound useful as a precursor of the compound, an acid generator, a resist composition, and a method for forming a resist pattern. A compound represented by formula (I). The compound represented by general formula (b1-1). In the formula, Q 1 is a divalent linking group or a single bond; Y 1 is an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; A cyclic group having 3 to 30 carbon atoms which may have a substituent is represented, and the ring structure has a —SO 2 — bond. M + is an alkali metal ion. A + is an organic cation. [Chemical 1] [Selection figure] None |