http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010085921-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_063a1b324005ddc15e16e7529c6258c4 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2008-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3309a39f4896f32f6305f5493eb81ee http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6873d36d083331698223f9743f695b2c |
| publicationDate | 2010-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2010085921-A |
| titleOfInvention | Resist material and pattern forming method using the same |
| abstract | A resist material used for lithography in which a barrier film is not provided on a resist film is improved in resolution to prevent pattern defects. First, on a substrate 101, perfluoroethyl acrylate which is a monomer containing halogen atoms (fluorine) and stable to acid, and polyperfluoroethyl acrylate which is a polymer containing fluorine and stable to acid, The resist film 102 is formed from a resist material having a polymer containing an acid labile group and a photoacid generator. Subsequently, pattern exposure is performed by selectively irradiating the resist film 102 with exposure light in a state where the liquid 103 is disposed on the resist film 101. Subsequently, development is performed on the resist film 102 that has been subjected to pattern exposure to form a resist pattern 102 b from the resist film 102. [Selection] Figure 2 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014170922-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013203744-A |
| priorityDate | 2008-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 109.