http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010084034-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J11-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J175-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J133-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J7-02
filingDate 2008-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a1b419a5832f9d502bf9139d72e178e
publicationDate 2010-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2010084034-A
titleOfInvention Silicon oxide film protective film for epitaxial film formation
abstract [PROBLEMS] To provide appropriate adhesion and adhesion to a silicon oxide film surface, which can be easily peeled off when removed, and derived from an adhesive film on the silicon oxide film surface after peeling. Provision of an adhesive film for protecting a silicon oxide film surface for forming an epitaxial film having a low impurity transfer property. An adhesive layer and a release layer are sequentially formed on a substrate, the adhesive layer contains an acrylic resin, an isocyanate-based crosslinking agent, and a nonionic surfactant, and a release rate of 300 mm / min. Measured under the 180 ° peel test conditions with a peel distance of 150 mm and a test specimen width of 20 mm, the peel strength after 0.5 hours has elapsed from 0.05 to 0.20 N / 20 mm. The peel strength after 24 hours is -30 to + 30% of the peel strength after 0.5 hours, and all the carbon on the silicon oxide film surface after peeling of the adhesive film stuck for 24 hours The adhesive film whose ratio with respect to an element is 8-18%. [Selection] Figure 1
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