| abstract |
A replica mold which has high durability against chemical, thermal and mechanical stress and can be suitably used for various nanolithography techniques including thermal NIL and optical NIL, and simply and inexpensively A method of making a replica mold is provided. General formula (I): [Chemical 1] (In the formula, R is a hydrocarbon group having 1 to 3 carbon atoms and PM is a residue of propylmethacrylic acid.) Using an organic-inorganic hybrid resin having a Si—O—Ti network represented by A replica mold is prepared. [Selection figure] None |