http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010066323-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1339 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1335 |
filingDate | 2008-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7efb1e04014153674b5e99f0f16bd350 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5cc14b972857d44fa40fb18191add04e |
publicationDate | 2010-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2010066323-A |
titleOfInvention | Photosensitive transfer material, resin pattern forming method, substrate with resin pattern, display device, and liquid crystal display device |
abstract | Provided is a photosensitive transfer material having good peelability between a cover film and a photosensitive resin layer at the time of peeling, and good adhesion between the cover film and the photosensitive resin layer before peeling. A ratio (A / B) of a monomer secondary ion intensity A and a total secondary ion intensity B (A / B) when the surface of a temporary support and a layer surface is measured with a secondary ion mass spectrometer is 0.0017-0. A photosensitive transfer material having a photosensitive resin layer 0145 and a cover film provided in contact with the surface of the photosensitive resin layer in this order. [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021166241-A1 |
priorityDate | 2008-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 152.