| abstract |
An improved vapor deposition method and apparatus for forming a multilayer / coating on a substrate is disclosed. The thickness of an oxide layer that is used to deposit a multilayer coating and is in direct contact with the substrate is controlled as a function of the chemical composition of the substrate. This allows later deposited layers to be better bonded to the oxide layer. The improved method is used to deposit a multilayer coating, in which the oxide layer is deposited directly on the substrate and the organic layer is deposited directly on the oxide layer. . Typically, a series of layers in which oxide layers and organic layers are alternately arranged is formed. [Selection figure] None |