| abstract |
The present invention provides a negative resist composition that exhibits good sensitivity and pattern shape, little residue, and little residual film in an unexposed area, and a pattern forming method using the same. A negative resist composition containing (A) an alkali-soluble resin, (B) a compound having a radical polymerizable group and an alkali-soluble group, and (C) a photoradical generator, and The pattern forming method used. [Selection figure] None |