http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010045416-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-47
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-812
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filingDate 2009-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec4aa3f1ba55f9f1eb9f7318cc65fc3a
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publicationDate 2010-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2010045416-A
titleOfInvention Group III nitride electronic devices
abstract A low-loss gallium nitride electronic device is provided. In A III nitride hetero-junction transistor 11a, a second Al Y1 In Y2 Ga 1-Y1 -Y2 N layer 15, the first Al X1 In X2 Ga 1-X1 -X2 N layer 13a And a heterojunction 21 is formed. The first electrode 17 forms a Schottky junction with the first Al X1 In X2 Ga 1-X1-X2 N layer 13a. The first Al X1 In X2 Ga 1-X1-X2 N layer 13 a and the second Al Y1 In Y2 Ga 1 -Y1-Y2 N layer 15 are provided on the substrate 23. The electrodes 17a, 18a, and 19a include a source electrode, a gate electrode, and a drain electrode, respectively. The carbon concentration N C13 of the first Al X1 In X2 Ga 1-X1-X2 N layer 13a is less than 1 × 10 17 cm −3 . The dislocation density D of the second Al Y1 In Y2 Ga 1 -Y1-Y2 N layer 15 is 1 × 10 8 cm −2 . A two-dimensional electron gas layer 25 is generated by the heterojunction 21. [Selection] Figure 1
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priorityDate 2009-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 34.