| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2008-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8b61fb1219b6bedfe5ba0f57f6bbdbd6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da70f0ee751771143f8486e137fe5bfa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5fe12e3bb401a4731ef3d014a7d0f335
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f1784d8d5536c8f0a015741a46eecbd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52cce40b8476edb4278cec332665b093
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5629ea1962b41d0773eaf45e8af40283 |
| publicationDate |
2010-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2010044347-A |
| titleOfInvention |
Resist composition, resist pattern forming method, novel compound and acid generator |
| abstract |
There are provided a resist composition and a resist pattern forming method capable of forming a resist pattern having a good shape, and an acid generator for the resist composition and a novel compound useful as the acid generator. A resist composition comprising a base material component whose solubility in an alkaline developer is changed by the action of an acid and an acid generator comprising a compound represented by formula (b1). In formula (b1), Y 1 is a fluorinated alkylene group having 1 to 4 carbon atoms, X is an aliphatic cyclic group having 3 to 30 carbon atoms; R 11 ′ to R 13 ′ are each an aryl group or an alkyl group. And at least one of them represents the general formula (b1-0) [R 52 represents a chain or cyclic hydrocarbon group, and f and g each represents 0 or 1. An alkyl group having a substituent represented by formula (I), wherein two alkyl groups of R 11 ′ to R 13 ′ may be bonded to each other to form a ring together with the sulfur atom in the formula. ] [Chemical 1] [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013047209-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016153901-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021199841-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011006400-A |
| priorityDate |
2008-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |