http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010044222-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5f5260a44f98154394a4fa1d69a8ec3c |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2008-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_22e088710732db0d0fddc6238caf8df2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_220d0c12e02575fd6ebc8a18728baa45 |
| publicationDate | 2010-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2010044222-A |
| titleOfInvention | Positive radiation sensitive resin composition |
| abstract | A resist pattern formed on a substrate can be exposed, heat-treated and developed to form a good resist pattern, and cracks can be suppressed when plating is performed on the substrate on which the resist pattern is formed. Provided is a positive-type radiation-sensitive resin composition. Formula (I) A positive radiation sensitive resin composition comprising a polymer having a structural unit represented by formula (1), a compound that generates an acid upon irradiation with radiation, and an organic solvent. [Selection figure] None |
| priorityDate | 2008-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 625.