| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_717c792fca7cc9c290c9db33e8fe078b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-773
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-762
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-742 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-775
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82B1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-06 |
| filingDate |
2008-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56c885bfc5047f3ff3c547286382c254
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_222ec8479ea2e72bd6015252427e5db8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_395812297ea74f4717eb478c4474bd12 |
| publicationDate |
2010-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2010041019-A |
| titleOfInvention |
Fabrication of nanostructured cross structure |
| abstract |
PROBLEM TO BE SOLVED: To provide production of a nanostructured cross structure. Techniques for producing cross-structures of nanostructures such as nanowires and carbon nanotubes are provided. In one embodiment, a method for producing a nanostructured cross structure includes providing a substrate, patterning a first mask layer on the substrate, and forming a first region on a surface region of the substrate where the first mask layer is not present. Adsorbing one nanostructure, removing the first mask layer from the substrate, patterning the second mask layer on the substrate on which the first nanostructure is adsorbed, and on the substrate Adsorbing the second nanostructure onto a surface region of the substrate where the second mask layer is not present under conditions effective to produce a nanostructured cross-structure. [Selection] Figure 1F |
| priorityDate |
2008-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |