| abstract |
A resist composition for immersion exposure which improves mask shape reproducibility, pattern collapse and exposure latitude when applied to immersion exposure, and has excellent immersion liquid followability, and a pattern formation method using the same. provide. A resist for immersion exposure comprising (A) a resin whose solubility in an alkaline developer is increased by the action of an acid, (B) a photoacid generator, and (C) a specific mixed solvent. Composition and pattern formation method using the same. [Selection figure] None |