abstract |
A resist composition suitable for immersion exposure, a resist pattern forming method using the resist composition, and a fluorine-containing polymer compound useful as an additive for the resist composition. The general formula (c0-0) [wherein R 6 is a hydrogen atom or a monovalent hydrocarbon group, q is an integer of 0 to 2, and g is an integer of 1 to 4. And a base component (A) whose solubility in an alkali developer is changed by the action of an acid. (Excluding those corresponding to the fluorine-containing polymer compound (C)) and an acid generator component (B) that generates an acid upon exposure, and a resist for immersion exposure Composition. [Chemical 1] [Selection figure] None |