http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009289941-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6ac179bcbad17b8ea0260c65f201da92 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2008-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3951fc9a5ea2467ccef6efef5c8a054c |
| publicationDate | 2009-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2009289941-A |
| titleOfInvention | Electronic material cleaning and storage methods |
| abstract | An electronic material cleaning method and storage method are provided. The cleaning method of the present invention is characterized by cleaning in a solution containing a hydroxy acid in the presence of microbubbles. According to the cleaning method of the present invention, it is possible to efficiently clean and remove particle components, oil contamination, etc. on the surface of the silicon wafer and prevent recontamination. [Selection] Figure 1 |
| priorityDate | 2008-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 80.