http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009288801-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_294881271413951a95f284b588a68e66 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate | 2009-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c6fa32c5a2f63fcc46460d78c8eb518 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cbe863580b86d80abd7be0f08ca95d3b |
| publicationDate | 2009-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2009288801-A |
| titleOfInvention | Manufacturing method of color filter |
| abstract | Provided is a method for producing a color filter in which the occurrence of uneven development is suppressed even when a dye-containing positive photoresist using a dye that is not sufficiently soluble in an alkaline aqueous solution is used. SOLUTION: A step S1 of applying a dye-containing positive photoresist on a color filter forming surface, a step S2 of performing pattern exposure on a coating film of the dye-containing positive photoresist, and developing with the first developer Step S3 for performing the step, Step S4 for removing a development residue made of a dye that can not be removed by the first developer but difficult to remove with an alkali, and a second developer for the third development. A step S5 for rinsing with a liquid and a step S6 for rinsing the third developer are included. [Selection] Figure 1 |
| priorityDate | 2009-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 44.