Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D17-10 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D17-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D17-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D21-18 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D21-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D17-10 |
filingDate |
2009-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_713bd6d84755b516d998b40c6d501227 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5b02485fd776327a4fbaaf897f661ad http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d19925cefdaeb3eff5a64d2bc374d97d |
publicationDate |
2009-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2009287118-A |
titleOfInvention |
Method for replenishing indium ions in an indium electroplating composition |
abstract |
An indium electroplating method is provided that provides improved electroplating composition stability and deposit morphology. A method for replenishing indium ions in an indium electroplating composition is disclosed. Indium ions are replenished during electroplating using indium salts of certain weak acids. This method can be used with soluble and insoluble anodes. [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011256410-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018168434-A |
priorityDate |
2008-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |