| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2009-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_097b0ad96c46111457687a44c217a8bc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a988f3fec52dd71e838f0c20ad819dc8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0578340d8eda8655050b54e7ae628333
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_811c9e6e856f6d34daba788e2d6e8199
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f1108117c8ba75da9b109979a2012b66 |
| publicationDate |
2009-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2009282507-A |
| titleOfInvention |
Photoresist composition |
| abstract |
The present invention provides a photoresist composition having a high receding angle and good resolution performance, and having good solubility in an exposed portion of a developer. (A) a resin containing a unit having an acid labile group in a side chain and (e) a unit having a structure containing fluorine in a side chain (A); At least one selected from the group consisting of: a unit having an acid labile group in the side chain, (i) a unit having a hydroxyl group in the side chain, and (u) a unit having a lactone structure in the side chain. In addition to containing (d) a photoresist composition containing a resin (B) containing a unit containing a fluorine-containing structure in the side chain; and an acid generator, the resin (B) (A) A photoresist composition in which the proportion of units having an acid-labile group in the side chain is less than 10 mol%. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012177807-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012118356-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011059516-A |
| priorityDate |
2008-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |