http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009276810-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B6-12
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filingDate 2009-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cee390009c5950965a6dc62d56cd72a7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ece355cfa85c10e8f0034f50107be2e
publicationDate 2009-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2009276810-A
titleOfInvention Manufacturing method of optical waveguide substrate
abstract PROBLEM TO BE SOLVED: To provide a method of manufacturing an optical waveguide substrate having an optical waveguide using a resin material, which has excellent crack resistance and reliability such as temperature cycling and leaving in a humidity. SOLUTION: A coating composition for forming a siloxane polymer film containing silanol groups is applied on a substrate, and the silanol groups are dehydrated in a nitrogen atmosphere at a temperature of 150 ° C. or higher and 220 ° C. or lower for 10 minutes to 4 hours. After the first step of forming a siloxane polymer film by polymerization, the dehydration polymerization reaction of the silanol groups remaining in the siloxane polymer film is accelerated by immersing the siloxane polymer film in an acid solution. An optical waveguide made of the siloxane polymer film formed by performing the step 2 is formed, and then the surface of the optical waveguide is covered with a protective layer made of oxide, nitride or oxynitride. [Selection] Figure 1
priorityDate 2009-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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