abstract |
A highly accurate wafer table position measurement and drive control is realized. [Solution] When the table WTB is located in a first area including an exposure area IA, the light source constituting the encoder system 16Xa, from 16Ya 1, the measuring light to the grating provided on the upper surface via the one side of the table WTB Lx1 , is incident Ly2 1, diffracted light Lx2 from these measurement light, Ly2 1 photodetector 16Xb, by receiving with 16Yb 1, measures the positional information of the table WTB. When the table WTB is located in the second region including the detection center of alignment system ALG from the light source 16Ya 2 is incident measurement light Ly2 2 to the grating, the diffracted light Ly2 2 using an optical detector 16Yb 2 received To measure position information. As a result, in both the first and second regions, it is possible to measure the position of the table with high accuracy, and consequently to control the drive of the table with high accuracy. [Selection] Figure 2 |