http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009231844-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-115
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filingDate 2009-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c8037fe016ee0bee6d0a286f779b3013
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publicationDate 2009-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2009231844-A
titleOfInvention Nonvolatile semiconductor memory device and manufacturing method thereof
abstract A nonvolatile semiconductor memory device having a MONOS type memory cell with the highest possible charge trapping efficiency and a method for manufacturing the same are provided. Source / drain regions 4a and 4b provided apart from a semiconductor substrate 5, a tunnel insulating film 12 provided on a semiconductor substrate 5 between the source region and the drain regions 4a and 4b, and tunnel insulation A charge storage film 13 provided on the film 12 for trapping charges, a control gate electrode 16 provided on the charge storage film 13, and provided between the charge storage film 13 and the control gate electrode 16. A memory cell including a transition alumina layer 14a provided on the film 13 side and an alumina film having an α-phase alumina layer 15a provided on the control gate electrode 16 side. [Selection] Figure 1
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priorityDate 2009-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 36.