http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009230063-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10 |
filingDate | 2008-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d2261d24110e2646368b4df8716cc7dd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3ad7671d74be56968b686a75140698f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_867055224ada746eb95f2975f83b6fde |
publicationDate | 2009-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2009230063-A |
titleOfInvention | Radiation sensitive resin composition |
abstract | In response to miniaturization of a line width of 90 nm or less, not only has excellent resolution performance, but also has low LWR, good PEB temperature dependency, excellent pattern collapse resistance, and low defectivity, that is, defects Excellent in properties. A polymer (A) containing a polymer (A1) and a polymer (A2), and a radiation-sensitive acid generator (B), wherein the polymer (A1) is represented by the formula (1). The polymer (A2) is a polymer containing the repeating unit represented by formula (3) and the repeating unit represented by formula (3). It is a polymer containing the repeating unit represented. [Selection] Figure 1 |
priorityDate | 2008-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 318.