| abstract |
High dielectric constant inductive material, low dielectric constant inductive material, and / or a range of metal regions that may selectively remove residues such as photoresist and be exposed to the composition To provide a composition capable of treating residue from a substrate without undesired attack. A composition for removing residue from a product, wherein the composition is one or more water-soluble organic solvents including glycol ethers; water; and the fluoride-containing compound is ammonium fluoride. A fluoride-containing compound provided that no additional fluoride-containing compound is added to the composition; and an optional quaternary ammonium compound; A composition for removing residues, comprising: [Selection figure] None |