| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-00 |
| filingDate |
2008-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58752add075e6c4533df235bf6d3a574 |
| publicationDate |
2009-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2009222792-A |
| titleOfInvention |
Photosensitive resin composition and method for forming light-shielding image. |
| abstract |
Provided is a photosensitive composition capable of obtaining a black matrix excellent in pattern accuracy and hardness by using nanoimprint lithography. In a state substantially free of a solvent after drying, it contains at least 10% by mass of a colorant and a polymerizable monomer, and has a viscosity of 3 to 50 mPa.s. A photosensitive resin composition characterized by being s. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9709710-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019225469-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9229136-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012079438-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2019225469-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11446738-B2 |
| priorityDate |
2008-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |