http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009209432-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_de498babb0c04a00ceb653738877b147 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 |
| filingDate | 2008-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f0600cc9da09628e04617aa5f17f7364 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5bce96448c5d65c52898e3ec09dbc01b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c9fc04bf8267f620c5ee30214137f61 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bfdbb12ab2ec2953b49b945250721214 |
| publicationDate | 2009-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2009209432-A |
| titleOfInvention | Raw material for chemical vapor deposition and method for producing aluminum oxide thin film using the same |
| abstract | A chemical vapor deposition material using an inexpensive aluminum halide as a precursor for an aluminum oxide thin film and a method for producing an aluminum oxide thin film using the raw material. A chemical vapor deposition material comprising an aluminum halide compound represented by the following general formula (1) and an organic compound having a cyano group represented by the following general formula (2) as a raw material for chemical vapor deposition: Use raw materials. (In the formula, X represents a halogen atom, R represents a hydrocarbon group having 1 to 10 carbon atoms, and n represents 1 or 2.) [Selection figure] None |
| priorityDate | 2008-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 58.