| abstract |
An imprint mold mask blank capable of forming a fine glass pattern with high pattern accuracy is provided. An imprint mold mask blank 10 having a glass substrate 1 and a thin film 2 formed on the substrate, wherein the thin film 2 is made of Ta or Ta compound, or Si or Si compound. It consists of a laminated film of an upper layer 4 made of a material that has a main component and can be etched by a dry etching process using a fluorine-based gas, and a lower layer 3 made of Cr or a Cr compound. [Selection] Figure 1 |