Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-262 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2201-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2201-04 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C1-1016 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-095 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
filingDate |
2008-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef5caaf2e285648bf3d6a85221ed114f |
publicationDate |
2009-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2009175195-A |
titleOfInvention |
Planographic printing plate precursor |
abstract |
A lithographic printing plate precursor excellent in reproducibility of high-definition images, printing durability and chemical resistance is provided. A positive-type recording layer having at least two infrared-sensitive positive-type recording layers containing a resin and an infrared absorber on a support, and being closest to the support among the two or more positive-type recording layers. The recording layer contains two or more kinds of resins including a polymer having a specific structural unit, and at least one of the resins forms a dispersed phase in the layer, and the alkaline aqueous solution dissolution rate of the resin forming the dispersed phase is high. It is characterized by being slower than the resin forming the matrix phase. [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018003405-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018150687-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2796928-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2796929-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2497639-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013200413-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013038909-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2439070-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013137345-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2551113-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2506077-A2 |
priorityDate |
2008-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |