| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2acf8601aa703e79bc22a2ab5d06dd92 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L75-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-08 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-83
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-32 |
| filingDate |
2008-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9d4eb93e507207bc8d6dab8545e211f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b71deeb66bf3f3889d222c169bf23a9a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_502c2cabf39c87f9d1259446294b3c23
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dc908521660af45550ee80623b354911
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_496ce54acdc75147aacf67e237b01c43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_71a65c5df7d53e02c7f9204fdf6c78ef |
| publicationDate |
2009-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2009173848-A |
| titleOfInvention |
Polyurethane curable and developable by radiation and photoresist composition curable and developable by radiation containing the same |
| abstract |
Provided are a polyurethane and a photoresist composition which can be cured and developed by irradiation. A specific polyurethane having a carboxylic acid group in the main chain and an acryloyl group and a carboxylic acid group in the side chain, and having a weight average molecular weight (Mw) measured by gel permeation chromatography (GPC). ) In the range of 3,000 to 400,000 and an acid value of 5 to 120 mg KOH / g, and a photoresist composition comprising the polymer as a main component. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110685034-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110685034-A |
| priorityDate |
2008-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |