| abstract |
Provided is a photosensitive resin composition for a photospacer having good alkali developability and having a cured product having excellent flexibility and elastic recovery properties. One or more types of reactivity selected from the group consisting of a hydrophilic resin (A), a polyfunctional (meth) acrylate monomer (B), an epoxy group, an oxetane group, a vinyl ether group, and a propenyl ether group. It is a photosensitive resin composition (Q) for a photospacer capable of alkali development, which contains a cationically polymerizable compound (C) having a functional group, a radical photopolymerization initiator (D), and an acid generator (E). [Selection figure] None |