| abstract |
A novel fluorine-containing compound useful as an additive for a resist composition for immersion exposure, a resist composition for immersion exposure containing the fluorine-containing compound, and a resist using the resist composition for immersion exposure A pattern forming method is provided. A substrate component (A) whose solubility in an alkaline developer is changed by the action of an acid, an acid generator component that generates an acid upon exposure, and a group represented by the following general formula (c): And a resist composition for immersion exposure, comprising a fluorine-containing compound (C) containing at least one fluorine atom. In the formula, Q is a group obtained by removing one hydrogen atom from a monovalent hydrophilic group, and R 1 is a hydrocarbon group having 2 or more carbon atoms which may have a fluorine atom. [Chemical 1] [Selection figure] None |