abstract |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for a photospacer having good alkali developability and having a cured product having excellent flexibility and elastic recovery characteristics. SOLUTION: A photosensitive resin composition containing a hydrophilic resin (A), a polyfunctional (meth) acrylate monomer (B), and a photo radical polymerization initiator (C), wherein the photosensitive resin composition is solid. The acryloyl group concentration based on the weight of the minute is 2.0 to 5.5 mmol / g, and the photo spacer formed by photocuring the photosensitive resin composition is elastic against a compressive load of 1.5 Gpa. It is a photosensitive resin composition (Q) for a photospacer capable of alkali development, having a recovery rate of 60% or more. [Selection] Figure 1 |