http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009105083-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336
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filingDate 2007-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f91c494f733b08ff76c2deb99d674f18
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publicationDate 2009-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2009105083-A
titleOfInvention Thin film transistor manufacturing method and thin film transistor manufactured by the manufacturing method
abstract A method for manufacturing a thin film transistor in which a source electrode, a drain electrode, and a semiconductor layer have good conduction characteristics and a thin film transistor manufactured by the manufacturing method are provided. A gate electrode is formed on an upper surface of a substrate of a thin film transistor, and a gate insulating layer is provided so as to cover the gate electrode. A source electrode 3, a drain electrode 4, and a semiconductor layer 7 are provided on the upper surface of the gate insulating layer 5. On the gate insulating layer 5 between the source electrode 3 and the semiconductor layer 7, an end portion of the source electrode 3 and Silver nano-ink 9 is applied and electrically connected (contacted) so as to cover the end of the semiconductor layer 7. Also, silver nano-ink 10 is applied on the gate insulating layer 5 between the drain electrode 4 and the semiconductor layer 7 so as to cover the end portion of the drain electrode 4 and the end portion of the semiconductor layer 7 to be electrically connected ( Contact). [Selection] Figure 2
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